Introduction
It is applicable to scientific research wavelength range of 420nm~1550nm. With phasemodulation bit depth >2π, HDSLM80R SLM meets the phase stability requirement ofinfrared wavebandand 1550nm communication waveband. Based on various coating optimization design, HDSLM80R SLM is divided into four phase-only types and oneamplitude-only type in order to meetvarious scientific research needs. It provides pixelsize of 8μm and resolution of 1920*1200. HDSLM80R SLM has been accredited as apriority choice by numerous universities and enterprises throughout the world.
Product Image
Specifications
| Type | Modulation Mode | Resolution | Frame Rate | Pixel Size | Bit Depth | Fill Factor | Amplitude Contrast | Phase Retardance | Wavelength |
| HDSLM80R | Phase | 1920*1200 | 60Hz | 8μm | 8bit | ＞95% | / | ＞5.8π@532nm | 420~1100nm |
| HDSLM80R-NIR | ＞2π@1064nm | 1064±100nm | |||||||
| HDSLM80R-TEC | ＞2π@1550nm | 1550±100nm | |||||||
| HDSLM80R-G | 2π@532nm | 532±50nm | |||||||
| HDSLM80RA | Amplitude | 1000:1 | / | 450~700nm |
Phase stability: 0.003π@24h / Linearity: 99.9% /
[Test method: power test demodulated phase, 25°C ambient temper, 532nm laser source].
Damage threshold: >5W/c㎡, water-cooled version 10W/c㎡ or more.
Application
It is not only applicable for researches on the subject of optical field regulation, optical communication, optical storage and opticalcomputer and development of holographic optical tweezers, but also applicable to the procurement of nanolithography machines,optical communication WSS modules, laser cutting cryptocutting equipment. This device supports customized application andlarge-scale commercial exploitation.
• Laser Stealth Dicing Technology
It is applicable to cutting machines for hard, thin, brittle, and transparent materials. The device provides damagethreshold exceeding 10W and well application to 140µJfemtosecond laser. It has been employed in scientificresearches of many universities throughout the world andpassed the practical application evaluation oflarge-scalelaser processing equipment companies in China.
• WSS Development
With 0.36dB interpolation loss which is comparatively lower in theindustry, it is a core component in the development of optical deviceproducts such as WSS and TOF.
• Projection Lithography
It provides 2W/c㎡ and 405nm projection lithography. The amplitudetype is the core component for the development of 3D printers andexposure machines. The phase type is typically used for thedevelopment of holographic printing and nanolithography equipment.
• Beam Deflection
The 1550nm type is a core beam control device for the development of multipoint laser trackers and vibrometers. With highly stable beam pointing accuracy, the HDSLM80R SLM provides stable performance in long-hour high precision tracking by the combination use with a tunable laser source.
